Silver Metallization - Stability and Reliability (Paperback, 2008)

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Here is the first book to discuss the current understanding of silver metallization and its potential as a future interconnect material for integrated circuit technology. With the lowest resistivity of all metals, silver is an attractive interconnect material for higher current densities and faster switching speeds in integrated circuits. Over the past ten years, extensive research has been conducted to address the issues that have prevented silver from being used as an interconnect metal. The authors provide details on a wide range of experimental, characterization, and analysis techniques. The book is written for students, scientists, engineers, and technologists in the fields of integrated circuits and microelectronics research and development.


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Product Description

Here is the first book to discuss the current understanding of silver metallization and its potential as a future interconnect material for integrated circuit technology. With the lowest resistivity of all metals, silver is an attractive interconnect material for higher current densities and faster switching speeds in integrated circuits. Over the past ten years, extensive research has been conducted to address the issues that have prevented silver from being used as an interconnect metal. The authors provide details on a wide range of experimental, characterization, and analysis techniques. The book is written for students, scientists, engineers, and technologists in the fields of integrated circuits and microelectronics research and development.

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Product Details

General

Imprint

Springer London

Country of origin

United Kingdom

Series

Engineering Materials and Processes

Release date

March 2012

Availability

Expected to ship within 10 - 15 working days

First published

2008

Authors

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Dimensions

235 x 155 x 7mm (L x W x T)

Format

Paperback

Pages

123

Edition

2008

ISBN-13

978-1-84996-705-1

Barcode

9781849967051

Categories

LSN

1-84996-705-9



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