Here is the first book to discuss the current understanding of silver metallization and its potential as a future interconnect material for integrated circuit technology. With the lowest resistivity of all metals, silver is an attractive interconnect material for higher current densities and faster switching speeds in integrated circuits. Over the past ten years, extensive research has been conducted to address the issues that have prevented silver from being used as an interconnect metal. The authors provide details on a wide range of experimental, characterization, and analysis techniques. The book is written for students, scientists, engineers, and technologists in the fields of integrated circuits and microelectronics research and development.
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Here is the first book to discuss the current understanding of silver metallization and its potential as a future interconnect material for integrated circuit technology. With the lowest resistivity of all metals, silver is an attractive interconnect material for higher current densities and faster switching speeds in integrated circuits. Over the past ten years, extensive research has been conducted to address the issues that have prevented silver from being used as an interconnect metal. The authors provide details on a wide range of experimental, characterization, and analysis techniques. The book is written for students, scientists, engineers, and technologists in the fields of integrated circuits and microelectronics research and development.
Imprint | Springer London |
Country of origin | United Kingdom |
Series | Engineering Materials and Processes |
Release date | March 2012 |
Availability | Expected to ship within 10 - 15 working days |
First published | 2008 |
Authors | Daniel Adams, Terry L. Alford, James W. Mayer |
Dimensions | 235 x 155 x 7mm (L x W x T) |
Format | Paperback |
Pages | 123 |
Edition | 2008 |
ISBN-13 | 978-1-84996-705-1 |
Barcode | 9781849967051 |
Categories | |
LSN | 1-84996-705-9 |